社会需求日益增长的单晶硅与微电子产品生产依赖于高纯水供应软化水设备的厂家在此领域扮演着至关重要的角色

我了解到单晶硅等硅材料、集成电路芯片及封装、液晶显示、光电器件和各种电子器件的微电子工业，它们都需要大量高纯水来清洗半成品和成品。目前，这些行业对水质的精度要求非常高，电阻度通常需达到10兆欧/厘米以上。这些工艺主要包括两种组合方式：一是反渗透水处理设备与离子交换设备的结合，以及二是反渗透水处理设备与电去离子（EDI）设备的搭配。

第一种组合方式的基本流程为：原水经过沙炭过滤器和精密过滤器，然后进入原水箱，再通过反渗透设备、混床（复床）到达纯水箱，最后由纯水泵推送至后置精密过滤器，最终达到用水点。这一种工艺用于制备超纯水，并且具有环保经济发展潜力巨大，其基本流程为：原water→沙炭过滤器→精密过滤器→原water加压泵→多介质过滤器→活性炭过滤器→软化机 →EDImembrane →PH调节 →第二级reverse osmosis →中间water tank -> pure water tank -> pure water pump -> use point

涂料油漆清洗剂生产也需要不同程度的高纯度，但其工艺过程有所不同。以下四种主要工艺可以根据不同的需求选择对应：

一级reverse osmosis: 原water + pressure pump + multi-media filter + activated carbon filter + softener + precision filter + reverse osmosis membrane (electric conductivity ≦ 10us/cm)

二级reverse osmosis: 原water+pressure pump+multi-media filter+activated carbon filter+softener+precision filter+first-stage reverse osmosis membrane+pure water storage tank+pure water circulation pump+pure water usage point (electric conductivity ≦ 2us/cm)

Ion exchange: 原water+pressure pump+multi-media filter+activated carbon filter+softener+purity of first-stage reverse osmosis membrane+mixed bed resin in the intermediate tank+mixed bed resin in the final stage+mixed bed reservoir+circulating pumps for mixed beds+circulating pumps for purified water+circulating pumps for purified water to usage points

EDI system: 原water + pressure pump + multi-media filtration system, activated carbon filtration system, and softening unit; then through a second-stage reverse osmotic membrane with positive charges on its surface; followed by pH adjustment, further treatment by an EDI device; then goes into a pure-water storage container and is pumped out as needed.

The production process of paint and cleaning agents has different requirements depending on their specific uses, which are reflected in these four main processes that can be selected based on different purity levels.